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Progress in Plasma Processing of Materials, 1997

ISBN 印刷:
1-56700-093-2

DIAGNOSTIC OF FLOW FIELDS OF SILICON PARTICLES IN AN RF PLASMA FOR PURIFICATION TREATMENTS

S. Magnaval
Laboratoire de Génie des Precédés Plasmas, Université P.et M. Curie ENSCP, 11 rue P.et M. Curie, 75005 Paris - France

M. Arnold
Laboratoire de Génie des Precédés Plasmas, Université P.et M. Curie ENSCP, 11 rue P.et M. Curie, 75005 Paris - France

I. Cazard-Juvernat
Laboratoire de Génie des Precédés Plasmas, Université P.et M. Curie ENSCP, 11 rue P.et M. Curie, 75005 Paris - France

E. Francke
Laboratoire de Génie Procédés Plasmas et Traitement de Surface, Université Pierre et Mane Curie- ENSCP 11-13, rue Pierre et Marie Curie 75231 Paris Cedex 05 France

Daniel Morvan
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

要約

The determination of experimental working conditions to treat injected powder has been made by different physical analyses. The velocities and sizes of the particles in an RF plasma have been characterized by Laser Doppler Anemometry and Phase Doppler Anemometry. The different experimental parameters have been studied such as the powder particle size distribution, the power applied and the chemical composition of the plasma gas. The introduction of the hydrogen into the plasma has shown to be efficient to eliminate oxygen, carbon and boron.