ホーム 書籍 電子書籍 ジャーナル 参考文献と会報 著者、編集者、レビュー者 A-Z商品インデックス 各受賞
Progress in Plasma Processing of Materials, 1999

ISBN:
1-56700-126-2 (印刷)

PHYSICO-CHEMICAL DATA BASE AND COMPUTATION RESULTS FOR INDUCTIVE PLASMA FLOWS

S. A. Vasil'evskii
THE INSTITUTE for PROBLEMS in MECHANICS in RUSSIAN ACADEMY of SCIENCES

Anatoly Kolesnikov


S. V. Utyuzhnikov
Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russia

G. S. R. Sarma
DLR, Institute fur Stromungsmechanik, Bunsen str. 10, D-37073 Gottingen, Germany

要約

Physico-chemical model, numerical methods and computation results for equilibrium inductive coupled plasma flows in plasmatron are presented for the five gases: air, nitrogen, oxygen, argon and carbon dioxide. Corresponding database includes thermodynamic and transport properties of the gases at temperature range 300 − 15000 K. Effective technique for calculation of multicomponent ionized gases transport properties is used based on the new formulation of Chapman-Enskog method with account for high approximations by Sonine polynomials. Some results of inductive plasma flows modeling at pressure 0.1 atm are presented. Numerical solutions of the Navier-Stokes equations coupled with quasi-ID approximation of Maxwell equations for stationary laminar axisymmetric flows with swirling have been obtained by Patankar-Spalding method. Some results have been obtained also by a new effective preconditioning technique and implicit finite difference scheme for solving the Navier-Stokes equations in the Mach number range 0,01 < M < 1.