カスタマーログイン 0 ショッピングカート
ホーム 書籍 電子書籍 ジャーナル 参考文献と会報 著者、編集者、レビュー者 A-Z商品インデックス
Progress in Plasma Processing of Materials, 2003

ISBN 印刷: 978-1-56700-192-1

ISBN オンライン: 978-1-56700-447-2

CHARACTERIZATION OF MPACVD PROCESS SUITABLE FOR NANOCRYSTALLINE DIAMOND FILMS DEPOSITION

要約

This work deals with the characterization of the Microwave Plasma Assisted Chemical Vapour Deposition (MPACVD) process suitable for nanocrystalline diamond growth. The microwave system used in this study was a Bell Jar reactor and the discharge was ignited in an Ar/H2/CH4 gas mixture. We were especially interested in the investigation of the effect of the simultaneous increase of the microwave power and H2 concentration. Diamond films were characterized by appropriate surface diagnostic techniques. The plasma was analysed through modelling and spectroscopic diagnostics. Results showed in particular that the increase of H2 amount and microwave power strongly influences the diamond film nanostructure. Besides, the high values measured for gas temperature were in good agreement with those predicted by the model. Eventually, the model showed that the relatively high gas temperature in Ar/H2/CH4 discharges was responsible of a strong thermal dissociation of H2.
ホーム Begell Digital Portal Begellデジタルライブラリー ジャーナル 書籍 電子書籍 参考文献と会報 著者、編集者、レビュー者 A-Z商品インデックス 価格及び購読のポリシー Begell Houseの概要 連絡先 Language English 中文 Русский 日本語 Português Deutsch Français Español