DEPOSITION OF YTTRIA-STABILISED ZIRCONIA COATINGS USING LIQUID PRECURSORS

Bouyer, E.; Branston, David W.; Lins , Gunter; Muller, Matthias; Verleger, J.; von Bradke, M.

Progress in Plasma Processing of Materials, 2001

ISBN 印刷: 1-56700-165-3

DEPOSITION OF YTTRIA-STABILISED ZIRCONIA COATINGS USING LIQUID PRECURSORS

E. Bouyer Institute for Technical Thermodynamics (ITT), German Aerospace Centre (DLR) Pfaffenwaldring 38-40, D-70569 Stuttgart, Germany

David W. Branston Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany

Gunter Lins Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany

Matthias Muller DLR, Institute of Technical Thermodynamics, Vaihingen, Pfaffenwaldring 38-40, D-70569 Stuttgart, Germany

J. Verleger Siemens Corporate Technology, ZT EN 3, Postfach 3220, 91050 Erlangen, Germany

M. von Bradke German Aerospace Center (DLR), Pfaffenwaldring 38-40, 70569 Stuttgart, Germany

要約

Aqueous solutions containing ZrO(NO₃)₂·6H₂O were injected into an inductively generated high-power plasma to produce zirconia coatings in a thermal plasma chemical vapour deposition (TPCVD) process. Coatings of monoclinic ZrO₂ which adhered well to the substrate were obtained when ZrO(NO₃)₂·6H₂O alone was present in the solvent with a concentration of 0.7 mol/1. When Y(NO₃)₃·6H₂O was added such that the concentration ratio of Zr and Y salts was 6:1, the ZrO₂ forming the coatings was stabilised in its cubic modification which was confirmed by X-ray diffractometry as well as EDX mapping.

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