RECOMBINATION AND DIFFUSION IN AN INDUCTIVELY COUPLED ARGON PLASMA DURING POWER INTERRUPTION

van der Mullen, Joost J.  A. M.; de Regt, J. M.; Jonkers, J.; de Groote, F. P. J.

Progress in Plasma Processing of Materials, 1997

ISBN 印刷: 1-56700-093-2

RECOMBINATION AND DIFFUSION IN AN INDUCTIVELY COUPLED ARGON PLASMA DURING POWER INTERRUPTION

Joost J. A. M. van der Mullen Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands

J. M. de Regt Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

J. Jonkers Department ofPhysics, Eindhoven University ofTechnology P.O. Box 513,5600 MB Eindhoven, The Netherlands

F. P. J. de Groote Department of Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

要約

The temporal behavior of the electron density n_e and temperature T_e during the power interruption of an inductively coupled plasma (ICP) is measured. The simulation of n_e as a function of time using a one-dimensional model including ambipolar diffusion and three particle recombination fits the measurements in the inner part (50% of the radius) of the plasma. However, for the measured fast n_e−decay observed at the outer part of the plasma other processes must be reponsible.

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