Войти 0 Корзина покупок
Главная Книги е-Книги Журналы Справочники & Сборники Авторы, Редакторы, Рецензенты А - Я индекс
Progress in Plasma Processing of Materials, 2001

ISBN Print: 1-56700-165-3

CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES

Аннотация

In the past few years, on-line monitoring of the elemental pollutants in the flue gas of industrial plants has been developed. Several field tests have been carried out on incineration plants or on various thermal processes. Such techniques are generally based on the injection of the gas to be analysed into an analytical lCP. The limits of detection observed are generally very low, similar to those obtained with classical argon ICP. However, when molecular species induce spectral interference with analytical lines, the detection limit fur the concerned element is strongly degraded. These molecular interferences depend on the nature of the gaseous matrix (the gas to be analysed), and on the operating conditions. Therefore the stability of the molecular species is linked to the plasma temperature in the analytical zone. It is such possible to reduce the interference varying generator power and flow rates. In the case of processes using only air, the main interferences are due to NO and N2+ bands. The elements the most affected are As and Pb. In the case of combustion gases, CN, CO and C2 are the most disturbing molecules, and affect the analysis of elements like As, Sb, Ph, Hg, and Zn.
Главная Begell Электронный Портал Begell Электронная библиотека Журналы Книги е-Книги Справочники & Сборники Авторы, Редакторы, Рецензенты А - Я индекс Цены и условия подписки О Begell House Контакты Language English 中文 Русский 日本語 Português Deutsch Français Español