Главная Книги е-Книги Журналы Справочники & Сборники Авторы, Редакторы, Рецензенты А - Я индекс Награды
Progress in Plasma Processing of Materials, 2001

ISBN Print:


S. Robert
Laboratoire de Genie des Precedes Plasmas et Traitement de Surface, Universite Pierre et Marie CURIE (Paris VI) ENSCP - 11, rue Pierre et Marie CURIE 75231, PARIS Cedex 05 - France

E. Francke
Laboratoire de Génie Procédés Plasmas et Traitement de Surface, Université Pierre et Mane Curie- ENSCP 11-13, rue Pierre et Marie Curie 75231 Paris Cedex 05 France

S. Cavadias
Laboratoire Genie Precedes Plasmas - ENSCP 11, rue Pierre et Marie Curie - 75005 Paris- France

M. F. Gonnord
Laboratoire des Mecanismes Reactionnels - CNRS UMR 7651, Ecole polytechnique, 91128 Palaiseau Cedex - France

Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France


An experimental study of the decomposition of acetaldehyde in a dry air mixture has been carried out using a dielectric barrier discharge. Operating parameters that affect the CH3CHO destruction efficiency include the gas mixture composition, the applied voltage, and the gas residence time in the reactor. The plasma is produced in a narrow gap by a dielectric barrier discharge at low applied voltage, 40 kHz. An isotopic labeling (CD3CHO) is used with gas chromatography-mass spectrometry identification of the formed stabilized species in order to investigate the mechanism of acetaldehyde decomposition, and especially the CH3 radical stability. Additionally, the influence of the plasmagen gas mixture composition on the chemical reaction pathways in the discharge has been studied.