Progress in Plasma Processing of Materials, 1999
ISBN Print: 1-56700-126-2
PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS
DOI: 10.1615/ITPPC-1998.890
pages 607-612
Аннотация
Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.
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