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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Print: 1093-3611
ISSN Online: 1940-4360

Том 24, 2020

Том 23, 2019

Том 22, 2018

Том 21, 2017

Том 20, 2016

Том 19, 2015

Том 18, 2014

Том 17, 2013

Том 16, 2012

Том 15, 2011

Том 14, 2010

Том 13, 2009

Том 12, 2008

Том 11, 2007

Том 10, 2006

Том 9, 2005

Том 8, 2004

Том 7, 2003

Том 6, 2002

Том 5, 2001

Том 4, 2000

Том 3, 1999

Том 2, 1998

Том 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief

Associate Editor

Редакционная коллегия

Nikolay N. Koval Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia; National Research Tomsk State University, 36 Lenin Ave., Tomsk, 634050, Russia
Email: koval@hcei.tsc.ru
Oleg F. Petrov Joint Institute of High Temperatures RAS, Russian Academy of Science, Moscow, Russia
Email: ofpetrov@ihed.ras.ru
Alexander D. Pogrebnjak Department of Nanoelectronics, Sumy State University, 2 Rimsky-Korsakov Str., 40007 Sumy, Ukraine
Email: alexp@i.ua
Gennadii E. Remnev National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia
Email: remnev@hvd.tpu.ru
Vladimir V. Uglov Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia
Email: uglov@bsu.by
Pawel Zhukowski Lublin University of Technology, Poland
Email: pawel@elektron.pol.lublin.pl