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O. S. Tolkachev
Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia
Get more info about author from Directory of Specialists
Articles
COMPLEX ELECTRON−ION PLASMA TREATMENT OF TITANIUM: METHODS, STRUCTURE, PROPERTIES
Vol. 21 '2017
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
FILM–SUBSTRATE SURFACE ALLOY FORMED BY AN INTENSE PULSED ELECTRON BEAM
Vol. 21 '2017
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ELECTRON-ION-PLASMA SYNTHESIS OF MULTILAYER CR−B FILMS
Vol. 27 '2023
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
AMORPHOUS-CRYSTALLINE BORON-CONTAINING COATING FORMED ON A HIGH-ENTROPY ALLOY BY A COMBINED ION-PLASMA METHOD
Vol. 28 '2024
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
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